High-rate reactive ion etching of barium hexaferrite films using optimal CHF3/SF6 gas mixtures
نویسندگان
چکیده
CHF3/SF6 gas mixtures Zhaohui Chen, Aria Yang, Changqing Xie, Qinghua Yang, C. Vittoria, and V. G. Harris Center for Microwave Magnetic Materials and Integrated Circuits and Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115 USA Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 People’s Republic of China
منابع مشابه
Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask
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